FIB Mill Controller
Purpose
The FIB Mill Controller skill provides focused ion beam process control for site-specific nanofabrication and sample preparation, enabling precise material removal and deposition at the nanoscale.
Capabilities
- TEM lamella preparation
- Nanoscale milling and deposition
- Pattern writing and editing
- Cross-section imaging
- Gas-assisted etching/deposition
- Damage minimization protocols
Usage Guidelines
FIB Processing
-
TEM Lamella Preparation
- Deposit protective cap
- Rough mill with high current
- Fine polish to target thickness
-
Nanofabrication
- Define pattern geometry
- Optimize beam parameters
- Minimize gallium implantation
-
Circuit Editing
- Navigate to target location
- Selective material removal
- Metal deposition for reconnection
Process Integration
- Nanodevice Integration Process Flow
- Multi-Modal Nanomaterial Characterization Pipeline
Input Schema
{
"operation": "lamella|milling|deposition|cross_section",
"material": "string",
"target_thickness": "number (nm, for lamella)",
"pattern_file": "string (for milling)",
"beam_voltage": "number (kV)"
}
Output Schema
{
"process_parameters": {
"beam_current": "number (pA)",
"dwell_time": "number (us)",
"overlap": "number (%)"
},
"milling_depth": "number (nm)",
"lamella_thickness": "number (nm)",
"damage_layer": "number (nm)",
"processing_time": "number (minutes)"
}